Nearfield instruments, a Rotterdam, the Netherlands-based developer of Metrology & Inspection (M&I) solutions for the semiconductor manufacturing industry, raised €135M in Series C funding.
The round was led by Walden Catalyst and Temasek with participation from Innovation Industries, Invest-NL, and ING. M&G Investments, through its Catalyst strategy, acted as a co-investor.
The company intends to use the funds to expand operations and its development efforts.
Led by CEO Dr. Hamed Sadeghian, Nearfield Instruments, a spin-off of Dutch research institute TNO, is bridging the semiconductor industry’s metrology and inspection challenges with in-line, non-destructive process control nanometrology solutions for advanced 3D memory and logic devices. Their technology combines high-resolution with high-throughput, essential for the production of advanced semiconductor nodes. The company has offices in Eindhoven, The Netherlands and Pyeongtaek, South Korea.
Commenting on the news, Hamed Sadeghian said: “We are thrilled that Nearfield’s’ QUADRA 3D metrology system has been fully integrated into the first major high-volume semiconductor manufacturing fab. This milestone solidifies our pioneering role in advancing critical metrology for leading-edge nodes. With significant contributions from investment leaders, we are well positioned to meet the growing demand for Metrology & Inspection in the coming decade. This funding will enable us to ramp up production capacity, expand our product portfolio, and strengthen our position as a key player in the semiconductor equipment industry.”
FinSMEs
18/07/2024